| Mitsui Chemicals America, Inc. markets raw materials
for the manufacture of photoresist chemicals through its affiliation with Honshu
Chemical Industry Co. Ltd. (Honshu Chemical), a subsidiary of its parent company,
to the United States market. Photoresists are light sensitive polymers that are
essential to the semiconductor manufacturing process. There is an extensive line
of photoresist raw materials offered by Honshu Chemical, spanning several hundred
different polyphenols including metal free grades.
Some of the types of chemicals available from Honshu through Mitsui Chemicals
are:
Photoresist Backbones
 |
Modifiers for improving the performance
of photoresists made of Novalac type phenolic resins such as m-cresol, 2,5-xylenol,
2,3,5-trimethylphenol and more complex phenolic compounds for high-resolution
I-line technology. |
|
Specialty acrylic monomers that provide transparency
and anti dry etching properties such as tetracyclododecyl acrylate for AR-F technology. |
|
Other monomers for Kr-F excimer technology such
as meta and para acetoxystyrene. |
Ballasting Agents for Photo Initiators
|
A wide variety of Bis-phenols, Tris-phenols
and Tetrakis-phenols that react with napthoquinone diazide to form photo initiators. |
Additives
|
For tandem-type photoresists relatively
low molecular weight compounds are intentionally incorporated to achieve better
performance. |
|
Additives for longer shelf life such as antioxidants
that have similar structures to the photoresist are required. |
Custom applications are possible, since Honshu Chemical has the technical competence
and expertise to develop new compounds to suit specific needs, from initial conception
in the lab to follow through with bench scale development and eventually into
various sized commercial plants. All photoresist raw material projects are executed
on a confidential basis. Please contact the product manager
for further information.
|
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© 1999-2008 Mitsui Chemicals America, Inc. All Rights Reserved.
